| Item | 4H P-type SiC substrate（2~6inch） | ||
| Diameter | 50.8±0.3mm | 100.0±0.3mm | 150.0±0.5mm |
| Thickness | 350±25μm | 350±25μm | 350±25μm |
| Surface Orientation | Off-Axis：2°-4°toward <11-20>±0.5° | ||
| Primary Flat Orientation | Parallel to <10-10>±5° | ||
| Primary Flat Length | 16.0±1.5mm | 32.5±2.0mm | 32.5±2.0mm |
| Secondary Flat Orientation | Silicon face up: 90° CW. from Primary flat±5.0° | ||
| Secondary Flat Length | 8.0±1.5mm | 18.0±2.0mm | 18.0±2.0mm |
| Resistivity | ≤0.1Ω•cm | ≤0.3Ω•cm | ≤0.3Ω•cm |
| Front Surface Finish | Si-Face: CMP, Ra<0.5nm | ||
| Back Surface Finish | C-Face: Optical Polish, Ra<1.0nm | ||
| Laser Mark | Back side: C-Face | ||
| TTV | ≤10μm | ≤15μm | ≤15μm |
| BOW | ≤25μm | ≤30μm | ≤40μm |
| WARP | ≤30μm | ≤40μm | ≤60μm |
| Edge Exclusion | ≤3 mm | ||
Customization specifications：
* Various sizes and shapes such as 10*10mm
* Various thicknesses:0.1~20mm
* Various surface roughness such as slicing,lapping,polishing.
* Silicon carbide crystal ingots are available.
Silicon carbide substrates(SiC) are the third-generation semiconductor materials and belong to Wide Band Gap Semiconductors. Silicon carbide(SiC) is a group IV-IV compound semiconductor material formed by C and Si elements in a ratio of 1:1 and has the characteristics of high temperature resistance, high critical breakdown electric field, high electron saturation migration rate and high thermal conductivity. Compared with silicon-based power devices, Silicon carbide devices will greatly improve the energy conversion efficiency because of its high voltage, high temperature and low loss. It will be one of the most basic and widely used materials for making semiconductor chips in the future.
| Crystal Structure | Hexagonal |
| Lattice Constant(nm) | a=3.082Å c=10.092Å |
| Density(g/cm3) | 3.23 |
| Stacking Sequence | ABCB |
| Mohs Hardness(mohs) | 9.2 |
| Dielectric Constant | 9.66 |
| Band Gap(eV) | 3.26 |
| Breakdown Electrical Field (MV/cm) | 2-5*106 |
| Thermal Conductivity(W/cm.K) | 3-5 |
| Thermal Expansion |
4.3*10-6/k 4.7*10-6/k |
| Refractive Index | 2.621～2.671 |
